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JEOL Launches HAXIS Low-Angle Ion Milling Scanning Electron Microscope
JEOL Ltd. announced the development of HAXIS, a new low-angle ion-milling scanning electron microscope, and began sales on October 5, 2026. The instrument is a semiconductor failure analysis platform that combines low-angle ion milling delayering with scanning electron microscopy imaging and passive voltage contrast analysis. According to the company, HAXIS delivers clear and highly reproducible PVC observation even on advanced semiconductors, using argon, an inert gas, to ensure stable surface quality and reduce running costs. The combined workflow is designed to speed the path from electrical failure detection to physical analysis and root-cause identification, supporting quick turnaround time failure analysis. JEOL is led by President and CEO Izumi Oi.
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6951.JP · Technology · Positive JEOL developed and launched HAXIS, a new low-angle ion-milling SEM platform for semiconductor failure analysis.